
| item | HPHE/SSPS-SH-2034 |
| Silica(SiO2)% | 38-42 |
| proportion(20℃,g/cm³) | 1.265-1.3 |
| PH(20℃) | 10.0-12.5 |
| Viscosity(20℃,mm²/s) | ≤5 |
| The average particle size(nm) | 120-140 |
| Modified additives | Have |
| Stable period (months) | 6 |
Product appearance: milky white;
Product use: suitable for polishing silicon, gallium arsenide and other semiconductor materials, with high purity and fast removal rate;
Note: 1. Packed in 25L\200L\1000L polyethylene plastic barrel, transported and stored in an environment of 0~40℃;
2. Avoid contact with eyes and skin during use. If you accidentally touch it, rinse it off with running water.

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